Biblio

Found 2 results

2005
2002
Conley, J. F., Y. Ono, W. Zhuang, L. Stecker, and G. Stecker, "Electrical Properties and Reliability of HfO2 Deposited via ALD using Hf(NO3)4 Precursor", IEEE 2002 Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 108 - 112, 10/2002. Abstract