OREGON STATE UNIVERSITY

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Filters: Author is Khaiser, M.  [Clear All Filters]
2001
Conley, J. F., Y. Ono, D. J. Tweet, W. Zhuang, M. Khaiser, and R. Solanki, "Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 11 - 15, 10/2001.