Biblio

Found 10 results

2003
, , , 05/2003.
, , , 01/2003.
2002
2001
Conley, J. F., Y. Ono, D. J. Tweet, W. Zhuang, M. Khaiser, and R. Solanki, "Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 11 - 15, 10/2001. Abstract