Biblio

Found 143 results

In Press
2013
Wager, J. F., and B. Yeh, "Oxide Thin-Film Transistors: Device Physics", Oxide Semiconductors, vol. 88: Elsevier, pp. 283 - 315, 2013. Abstract
2012
Wager, J. F., K. Hoshino, E. S. Sundholm, R. E. Presley, R. Ravichandran, C. C. Knutson, D. A. Keszler, R. L. Hoffman, D. A. Mourey, and J. Robertson, "A framework for assessing amorphous oxide semiconductor thin-film transistor passivation", Journal of the Society for Information Display, vol. 20, issue 10, pp. 589 - 595, 10/2012. Abstract

Best paper of 2012 for the Journal of Information Display

2011
Pelatt, B. D., R. Ravichandran, J. F. Wager, and D. A. Keszler, "Atomic Solid State Energy Scale", Journal of the American Chemical Society, vol. 133, issue 42, pp. 16852 - 16860, 10/2011. Abstract
Waggoner, T., J. Triska, K. Hoshino, J. F. Wager, and J. F. Conley, "Zirconium oxide-aluminum oxide nanolaminate gate dielectrics for amorphous oxide semiconductor thin-film transistors", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 29, issue 4, pp. 04D115, 07/2011. Abstract
Wager, J. F., "Oxide Thin-Film Transistors", Handbook of Visual Display Technology, vol. 1, 2011.
2010
Alimardani, N., J. F. Conley, E. W. Cowell, J. F. Wager, M. Chin, S. Kilpatrick, and M. Dubey, "Stability and bias stressing of metal/insulator/metal diodes", 2010 IEEE International Integrated Reliability Workshop (IIRW), S. Lake Tahoe, CA, IEEE, pp. 80 - 84, 10/2010. Abstract
Wager, J. F., "Transfer-curve assessment of oxide thin-film transistors", Journal of the Society for Information Display, vol. 18, issue 10, pp. 749–752, 10/2010. Abstract
Hoshino, K., and J. F. Wager, "Operating Temperature Trends in Amorphous In–Ga–Zn–O Thin-Film Transistors", IEEE Electron Device Letters, vol. 31, issue 8, pp. 818 - 820, 08/2010. Abstract
Cowell, III, W. E., C. C. Knutson, J. F. Wager, and D. A. Keszler, "Amorphous Metal/Oxide Nanolaminate", ACS Applied Materials & Interfaces, vol. 2, issue 7, pp. 1811 - 1813, 07/2010. Abstract
Triska, J., J. F. Conley, R. E. Presley, and J. F. Wager, "Bias stress stability of zinc-tin-oxide thin-film transistors with Al2O3 gate dielectrics", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 28, issue 4, pp. C5I1, 07/2010. Abstract
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