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Filters: Author is Hoshino, Ken  [Clear All Filters]
Wager, J. F., K. Hoshino, E. S. Sundholm, R. E. Presley, R. Ravichandran, C. C. Knutson, D. A. Keszler, R. L. Hoffman, D. A. Mourey, and J. Robertson, "A framework for assessing amorphous oxide semiconductor thin-film transistor passivation", Journal of the Society for Information Display, vol. 20, issue 10, pp. 589 - 595, 10/2012.
Best paper of 2012 for the Journal of Information Display
Jiang, K., J. T. Anderson, K. Hoshino, D. Li, J. F. Wager, and D. A. Keszler, "Low-Energy Path to Dense HfO2 Thin Films with Aqueous Precursor", Chemistry of Materials, vol. 23, issue 4, pp. 945 - 952, 02/2011.
Hoshino, K., and J. F. Wager, "Operating Temperature Trends in Amorphous In–Ga–Zn–O Thin-Film Transistors", IEEE Electron Device Letters, vol. 31, issue 8, pp. 818 - 820, 08/2010.
Hoshino, K., D. Hong, H. Q. Chiang, and J. F. Wager, "Constant-Voltage-Bias Stress Testing of a-IGZO Thin-Film Transistors", IEEE Transactions on Electron Devices, vol. 56, issue 7, pp. 1365 - 1370, 05/2009.