You are here


Found 3 results
Filters: Author is Suehle, J.S.  [Clear All Filters]
Conley, J. F., J. S. Suehle, A. H. Johnston, B. Wang, T. Miyahara, E. M. Vogel, and J. B. Bernstein, "Heavy-ion-induced soft breakdown of thin gate oxides", IEEE Transactions on Nuclear Science, vol. 48, issue 6, pp. 1913 - 1916, 12/2001.
Wang, B., J. S. Suehle, E. M. Vogel, J. F. Conley, C. E. Weintraub, A. H. Johnston, and J. B. Bernstein, "Latent reliability degradation of ultra-thin oxides after heavy ion and γ-ray irradiation", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 16 - 19, 10/2001.
Suehle, J. S., T. Meyers, and J. F. Conley, "The Effects of Ionizing Radiation on Wear-Out and Reliability of Thin Gate Oxides", 2000 IEEE Microelectronics and Reliability and Qualification Workshop, 11/2000.