OREGON STATE UNIVERSITY

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Biblio

Found 7 results
Filters: Author is Tweet, D. J.  [Clear All Filters]
2003
Conley, J. F., Y. Ono, D. J. Tweet, W. Zhuang, and R. Solanki, "Atomic layer deposition of thin hafnium oxide films using a carbon free precursor", Journal of Applied Physics, vol. 93, issue 1, pp. 712-718, 01/2003.
2001
Conley, J. F., Y. Ono, D. J. Tweet, W. Zhuang, M. Khaiser, and R. Solanki, "Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 11 - 15, 10/2001.