Heavy-ion-induced soft breakdown of thin gate oxides

TitleHeavy-ion-induced soft breakdown of thin gate oxides
Publication TypeJournal Article
Year of Publication2001
AuthorsConley, J. F., J. S. Suehle, A. H. Johnston, B. Wang, T. Miyahara, E. M. Vogel, and J. B. Bernstein
JournalIEEE Transactions on Nuclear Science
Pagination1913 - 1916
Date Published12/2001

Heavy-ion-induced soft and hard breakdown are investigated in thin gate oxides as a function of linear energy transfer, fluence, and voltage applied during irradiation. It is found that postirradiation oxide conduction is well described by the Sune quantum point contact model.

Short TitleIEEE Trans. Nucl. Sci.