Alternating Pulse Deposition of High-k Metal Oxide Thin Films using Hf(NO3)4 as a Metal and an Oxygen Source with Multiple in-situ Annealing

TitleAlternating Pulse Deposition of High-k Metal Oxide Thin Films using Hf(NO3)4 as a Metal and an Oxygen Source with Multiple in-situ Annealing
Publication TypeConference Paper
Year of Publication2003
AuthorsConley, J. F., Y. Ono, D. Tweet, G. Stecker, R. Solanki, and W. W. Zhuang
Conference Name204th Meeting of The Electrochemical Society,
Date Published10/2003