Directed integration of ZnO nanobridge sensors using photolithographically patterned carbonized photoresist

TitleDirected integration of ZnO nanobridge sensors using photolithographically patterned carbonized photoresist
Publication TypeJournal Article
Year of Publication2010
AuthorsHuang, C. - C., B. D. Pelatt, and J. F. Conley
JournalNanotechnology
Volume21
Issue19
Pagination195307
Date Published05/2010
ISSN1361-6528
Abstract

A method for achieving large area integration of nanowires into electrically accessible device structures remains a major challenge. We have achieved directed growth and integration of ZnO nanobridge devices using photolithographically patterned carbonized photoresist and vapor transport. This carbonized photoresist method avoids the use of metal catalysts, seed layers, and pick and place processes. Growth and electrical connection take place simultaneously for many devices. Electrical measurements on carbonized photoresist/ZnO nanobridge/carbonized photoresist structures configured as three-terminal field effect devices indicate bottom gate modulation of the conductivity of the n-type ZnO channel. Nanobridge devices were found to perform well as ultraviolet and gas sensors, and were characterized as regards ultraviolet light pulsing, oxygen concentration, and humidity. The sensitivity of the three-terminal nanobridge sensors to UV light and oxygen was enhanced by application of a negative bottom gate voltage.

DOI10.1088/0957-4484/21/19/195307
Short TitleNanotechnology