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Conley, J. F., L. Stecker, and Y. Ono, "Selective growth and directed integration of ZnO nanobridge devices on si substrates without a metal catalyst using a ZnO seed layer", Journal of Electronic Materials, vol. 35, issue 4, pp. 795 - 802, 04/2006.
Conley, J. F., L. Stecker, and Y. Ono, "Directed Integration of ZnO Nanobridge Devices on a Si Substrate", Applied Physics Letters, vol. 87, issue 22, pp. 223114, 11/2005.
Dong, L., V. Chirayos, J. Bush, J. Jiao, V. M. Dubin, R. V. Chebian, Y. Ono, J. F. Conley, and B. D. Ulrich, "Floating-potential dielectrophoresis-controlled fabrication of single-carbon-nanotube transistors and their electrical properties.", The Journal of Physical Chemistry B, vol. 109, issue 27, pp. 13148-13153 - 13148-53, 07/2005.
Lenahan, P. M., and J. F. Conley, "Magnetic Resonance Studies of Trapping Centers in High-κ Dielectric Films on Silicon", IEEE Transactions on Device and Materials Reliability, vol. 5, issue 1, pp. 90 - 102, 03/2005.
Conley, J. F., L. Stecker, and Y. Ono, "Directed assembly of ZnO nanowires on a Si substrate without a metal catalyst using a patterned ZnO seed layer", Nanotechnology, vol. 16, issue 2, pp. 292 - 296, 02/2005.
Dautrich, M. S., P. M. Lenahan, A. Y. Kang, and J. F. Conley, "Noninvasive nature of corona charging on thermal Si∕SiO[sub 2] structures", Applied Physics Letters, vol. 85, issue 10, pp. 1844-1845, 09/2004.
Gao, W., J. F. Conley, and Y. Ono, "NbO as gate electrode for n-channel metal-oxide-semiconductor field-effect-transistors", Applied Physics Letters, vol. 84, issue 23, pp. 4666, 06/2004.
Conley, J. F., Y. Ono, and D. J. Tweet, "Densification and improved electrical properties of pulse-deposited films via in situ modulated temperature annealing", Applied Physics Letters, vol. 84, issue 11, pp. 1913-1915, 03/2004.
Conley, J. F., D. J. Tweet, Y. Ono, and G. Stecker, "Interval Annealing During Alternating Pulse Deposition", MRS Proceedings, vol. 811, pp. 5-10, 01/2004.
Conley, J. F., Y. Ono, D. J. Tweet, and R. Solanki, "Pulsed deposition of metal–oxide thin films using dual metal precursors", Applied Physics Letters, vol. 84, issue 3, pp. 398-400, 01/2004.