John Conley

Professor
Electrical & Computer Engineering
Education: 
  • 1995    Ph.D., Engineering Science and Mechanics
    The Pennsylvania State University, University Park, PA
  • 1991    B.S., Electrical Engineering
    The Pennsylvania State University, University Park, PA
Biography: 

John F. Conley, Jr. earned his B.S. in electrical engineering in 1991 and Ph.D. in engineering science and mechanics in 1995 from The Pennsylvania State University where he won a 1996 Xerox Prize for his Ph.D. dissertation.

He was at Dynamics Research Corporation from 1995 to 2000 and at the Jet Propulsion Laboratory from 2000-2001, where he received an achievement award. In 2001, he became a senior member of the technical staff at Sharp Laboratories of America (SLA) and from 2005-2007 was Leader of the Novel Materials and Devices Group. In 2002-03, he served as an adjunct professor at the Vancouver campus of Washington State University. Since 2007, he has been a Professor and an ONAMI Signature Faculty Fellow at Oregon State University in both the School of Electrical Engineering and Computer Science and the Intercollege Materials Science Program. His research interests include atomic layer deposition, high-κdielectrics, thin film transistors, metal/insulator/metal tunnel diodes, directed integration of nanomaterials and nanodevices, electron spin resonance identification of electrically active point defects, reliability, and radiation effects in novel electronic materials. He is a senior member of IEEE.

Dr. Conley has served as a guest editor for three special issues of IEEE Transactions on Device and Material Reliability and has served on the technical and management committees of the IEEE IRPS, the IEEE SOI Conference, and the IEEE Nuclear and Space Radiation Effects Conference, was technical program chair of the 2000 IEEE Microelectronics Reliability and Qualification Workshop, and general program chair of the 2006 IEEE International Integrated Reliability Workshop. Dr. Conley has authored or co-authored over 100 technical papers (including several invited) and over 100 conference presentations. He also holds eighteen U.S. patents and has presented tutorial short courses on high-k dielectrics at two international conferences.

Research group: 
Research Interests: 

Dr. Conley's research interests include atomic layer deposition, high-κdielectrics, thin film transistors, metal/insulator/metal tunnel diodes, directed integration of nanomaterials and nanodevices, electron spin resonance identification of electrically active point defects, reliability, and radiation effects in novel electronic materials.

2002
2001
, , , 12/2001.
Conley, J. F., J. S. Suehle, A. H. Johnston, B. Wang, T. Miyahara, E. M. Vogel, and J. B. Bernstein, "Heavy-ion-induced soft breakdown of thin gate oxides", IEEE Transactions on Nuclear Science, vol. 48, issue 6, pp. 1913 - 1916, 12/2001. Abstract
, , , 11/2001.
Vandooren, A., J. F. Conley, S. Cristoloveanu, M. Mojarradi, and E. Kolawa, "Degradation mechanisms in SOI n-channel LDMOSFETs", Microelectronic Engineering, vol. 59, issue 1-4, pp. 489 - 495, 11/2001. Abstract
Wang, B., J. S. Suehle, E. M. Vogel, J. F. Conley, C. E. Weintraub, A. H. Johnston, and J. B. Bernstein, "Latent reliability degradation of ultra-thin oxides after heavy ion and γ-ray irradiation", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 16 - 19, 10/2001. Abstract
Conley, J. F., Y. Ono, D. J. Tweet, W. Zhuang, M. Khaiser, and R. Solanki, "Preliminary investigation of hafnium oxide deposited via atomic layer chemical vapor deposition (ALCVD)", IEEE 2001 International Integrated Reliability Workshop (IRW), Lake Tahoe, CA, IEEE, pp. 11 - 15, 10/2001. Abstract
Conley, J. F., A. Vandooren, L. Reiner, S. Cristoloveanu, M. Mojarradi, and E. Kolowa, "Radiation induced degradation of SOI n-channel LDMOSFETs", 2001 IEEE International SOI Conference, Durango, CO, IEEE, pp. 125 - 126, 10/2001. Abstract
2000