Atomic Layer Deposition (ALD) has remarkably developed in semiconductor and nano-structure applications since early 1990. The unique properties, including controlling atomic-level-thickness, manipulating atomic-level-composition control, and depositing impurity-free films uniformly, may accelerate ALD related industries and applications in functional thin film markets. One of big commercial industries, display market, just starts to look at the potential to adopt various functional inorganic/organic/hybrid films based on ALD/molecular layer deposition (MLD) techniques in emerging applications, such as transparent, flexible, and wearable electronics.
Recently, amorphous oxide semiconductors have been widely studied for the potential use in flat panel displays such as active matrix liquid crystal display (LCD) and Organic light emitting diodes (OLEDs). Since reporting amorphous InGaZnO semiconductor thin film transistor (TFT) in 2003 & 2004, many multi-component oxide semiconductors have been intensively investigated and developed by reactive sputtering method. Very recently, the sputtered InGaZnO TFTs are already adopted in mass-production to fabricate AMOLED TVs. However, there remain several problems such as high mobility & stability issues. Also, virtual and argument reality (VR, AR) applications are rapidly emerging in display markets but the main issues are high resolution and low voltage driving technologies.
In this talk, I will take the brief emerging display market trend and forecast to understand what they are looking for. In fact, the AMOLED (active matrix organic light emitting diode) Television markets are just starting at early 2013. There are a few possibilities and needs to be developing for AMOLED, flexible and transparent Display markets. Then, firstly, functional oxide and organic thin films, deposited by ALD/MLD have been demonstrated in emerging applications (flexible, transparent, and wearable things). Gas diffusion barrier property such as water and oxygen water vapor are important for passivation and encapsulation applications. Secondly, the functional oxide conductor/semiconductor films deposited by ALD will be discussed for applying transparent conductor and thin film transistor as an active layer even on flexible substrates, including InOx, SnOx, ZnSnO, InZnOx, InZnSnOx, and InGaZnOx. Also, I will update recent results of p-type ALD SnO semiconductors including physical, chemical, and electrical properties, that is a unique ALD film under a specific chemical precursor. As a new deposition process in Display industries, ALD will be intensively discussed for applying the emerging electronic devices.