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Tasker-Chiang DC/RF magnetron sputtering systemFeatures:Fully automated control with the linear substrate translator Documents:
User's guide |
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AJA RF magnetron sputtering systemFeatures:Five 2" guns installed Documents:Will be uploaded soon |
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Electron beam evaporation / sputter desposition systemFeatures:
Fully automated control Documents:Will be uploaded soon |
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CPA RF magnetron sputtering systemFeatures:
One 2" and one 3" guns installed Documents: |
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Glove boxFeatures:
Dehydration oven capable of up to ~600 ºC Documents:
Operation manual |
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Reactive ion etching (RIE) systemFeatures:
Patially automated control Documents: |
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Plasma-enhanced chemical vapor deposition (PE-CVD) systemFeatures:- Documents:N/A |
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Polaron thermal evaporation systemFeatures:Desktop thermal evaporator exclusively used for aluminum contact deposition Documents: |
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Rapid thermal anneal (RTA) systemFeatures:
Quartz chamber with halogen lamps Documents: |
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Neytech furnaceFeatures:Vacuum sealed chamberwith the forming gas introduction capabilities Documents:N/A |
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Eurotherm 47900 box furnaceFeatures:Small box furnace with the Eurotherm temperature controller Documents: |
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Eurotherm 62700 box furnaceFeatures:
Large box furnace with the Eurotherm temperature controller Documents: |
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Probestation and semiconductor parameter analyzerFeatures:
Probe station with the semiconductor parameter analyzer Agilent 4155/4156C Documents:
Agilent 4155/4156C User's GuideVol.1 and Vol.2 |
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Tencor AlphaStep 100 profilometerFeatures:Tungsten stylus-based thin film relative thickness profiler Documents:N/A |